Daniel J Fulford

Albany, NY, United States of America

Daniel J Fulford

Graduated from:
  • Boise State University
  • Texas Tech University
  • Central Texas College
Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 19(Granted Patents)

Forward Citations (Not Self Cited) = 5(Sep 21, 2024)

Location History:

  • Meridian, ID (US) (2017 - 2018)
  • Cohoes, NY (US) (2021 - 2023)
  • Albany, NY (US) (2019 - 2024)
  • Ballston Lake, NY (US) (2023 - 2024)


Years Active: 2017-2025

where 'Filed Patents' based on already Granted Patents

24 patents (USPTO):

Title: The Innovative Mind of Daniel J. Fulford

Introduction

Daniel J. Fulford, an inventor based in Albany, NY, has made significant contributions to the field of semiconductor technology through his innovative patents. With a remarkable portfolio of 21 patents, he continues to push the boundaries of what is possible in wafer processing technology. His inventions focus on enhancing the efficiency and precision of photolithography processes, which are critical in the manufacturing of semiconductor devices.

Latest Patents

Among his latest patents, Fulford has introduced groundbreaking technologies such as:

1. **In-situ lithography pattern enhancement with localized stress treatment tuning using heat zones**: This patent details a wafer processing device designed to optimize wafer shape. The device incorporates a first hot plate for uniform heating and a second hot plate featuring multiple independently controllable heating zones. This allows for precise temperature adjustments based on bow measurements, enhancing the overall quality of wafer processing.

2. **Precision multi-axis photolithography alignment correction using stressor film**: This innovative method addresses overlay alignment challenges by employing a stressor film on the backside of the wafer. By modifying the overlay alignment in a specified direction, the method improves the accuracy of semiconductor structures fabricated on the wafer's working surface.

Career Highlights

Daniel's career is marked by his role at Tokyo Electron Limited, a prominent player in the semiconductor manufacturing industry. His work has not only advanced the state of wafer processing techniques but has also influenced the broader field of semiconductor device fabrication. Fulford has consistently contributed to enhancing manufacturing processes, making them more efficient and effective.

Collaborations

Collaboration is key in technological advancements, and Daniel's work with coworker Jodi Grzeskowiak highlights this principle. Together, they have combined their expertise to develop patents that address complex challenges within the semiconductor industry, showcasing the importance of teamwork in driving innovation.

Conclusion

Daniel J. Fulford exemplifies the spirit of innovation in the semiconductor industry. His extensive patent portfolio and collaborations reflect his dedication to enhancing wafer processing technologies. As he continues to explore new frontiers in the field, Fulford's contributions are set to leave a lasting impact on semiconductor manufacturing practices.

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