Daniel J Fulford

Albany, NY, United States of America

Daniel J Fulford

This inventor holds 35 USPTO granted patents and 10 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2017-2026. Education: Boise State University; Texas Tech University; Central Texas College.

Graduated from:
  • Boise State University
  • Texas Tech University
  • Central Texas College
USPTO Granted Patents = 35 

% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 26(Granted Patents)


Location History:

  • Meridian, ID (US) (2017 - 2018)
  • Cohoes, NY (US) (2021 - 2023)
  • Albany, NY (US) (2019 - 2024)
  • Ballston Lake, NY (US) (2023 - 2024)

Company Filing History:


Years Active: 2017-2026

Loading Chart...
35 patents (USPTO):Explore Patents

Title: The Innovations of Daniel J Fulford

Introduction

Daniel J Fulford is a prominent inventor based in Albany, NY (US). He has made significant contributions to the field of technology, holding a total of 35 patents. His work primarily focuses on methods and systems that enhance manufacturing processes and improve product quality.

Latest Patents

Among his latest patents is a method of forming patterns. This innovative technique involves exposing a photoresist layer formed over a substrate to a first ultraviolet light (UV) radiation with a wavelength of 365 nm or longer. The process includes using a mask to create features at a first critical dimension, resulting in first portions exposed to the UV radiation and second portions that remain unexposed. Following this, both portions are exposed to a second UV radiation, and the photoresist layer is developed to form sub-resolution features with a second critical dimension that is less than the first. Another notable patent is the system and method for liquid dispense and coverage control. This invention utilizes light to monitor the coating of a liquid on a substrate. By directing light to a specific spot, the behavior of the light when the liquid passes through can indicate whether the substrate has been successfully coated, as well as help identify defects and monitor coating times for process adjustments.

Career Highlights

Daniel J Fulford is currently employed at Tokyo Electron Limited, a company known for its advanced technology solutions. His work at this organization has allowed him to further develop his innovative ideas and contribute to the advancement of the industry.

Collaborations

Throughout his career, Fulford has collaborated with notable colleagues, including Anton J deVillers and H Jim Fulford. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Daniel J Fulford's contributions to the field of technology through his numerous patents and innovative methods have made a significant impact. His work continues to influence advancements in manufacturing processes and product quality.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…