Edina, MN, United States of America

Daniel Boyd Sullivan

This inventor holds 10 USPTO granted patents. Top assignees: International Business Machines Corporation, Other. Active years: 1997-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel Boyd Sullivan. Retrieved from https://idiyas.com/inventor/daniel-boyd-sullivan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 30.0

Average Co-Inventor Count = 1.6

ph-index = 6

Forward Citations = 101(Granted Patents)


Location History:

  • Raleigh, NC (US) (1997 - 1999)
  • Milton, VT (US) (2005)
  • Durham, NC (US) (2002 - 2007)
  • Edina, MN (US) (2009 - 2011)

Company Filing History:


Years Active: 1997-2011

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10 patents (USPTO):Explore Patents

Title: The Innovations of Daniel Boyd Sullivan

Introduction

Daniel Boyd Sullivan is a notable inventor based in Edina, MN (US). He holds a total of 10 patents, showcasing his significant contributions to the field of technology and innovation. His work primarily focuses on advancements in lithographic systems and mask pattern generation.

Latest Patents

One of Sullivan's latest patents is titled "Pre-alignment marking and inspection to improve mask substrate defect tolerance." This method involves determining defect types and locations on a mask blank, generating alignment marks, and selecting a mask pattern based on the identified defects. Another significant patent is "Multiple pattern generator integration with single post expose bake station." This system allows multiple exposure stations to share a post-expose bake station, optimizing the scheduling of work through a centralized control system.

Career Highlights

Throughout his career, Sullivan has worked with prominent companies, including International Business Machines Corporation (IBM). His experience in these organizations has contributed to his expertise in developing innovative solutions in the lithography field.

Collaborations

Sullivan has collaborated with notable professionals in his field, including Edward W Conrad and Craig E Schneider. These collaborations have likely enhanced his work and led to further advancements in his projects.

Conclusion

Daniel Boyd Sullivan's contributions to innovation and technology are evident through his patents and career achievements. His work continues to influence the field of lithography and mask pattern generation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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