The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Mar. 27, 2008
Daniel Boyd Sullivan, Edina, MN (US);
Brain Neal Caldwell, Milton, VT (US);
Adam Charles Smith, Colchester, VT (US);
Jed Hickory Rankin, Richmond, VT (US);
Daniel Boyd Sullivan, Edina, MN (US);
Brain Neal Caldwell, Milton, VT (US);
Adam Charles Smith, Colchester, VT (US);
Jed Hickory Rankin, Richmond, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A system and method of operation for a lithographic system having multiple exposure stations sharing one or more post-expose bake station and a centralized control system that schedules work through the expose station to the post-expose bake station while taking into consideration the patterning time for work pieces to be scheduled as well as the amount of post-expose delay allowable for the exposed work pieces.