The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2011

Filed:

Mar. 03, 2008
Applicants:

Monica J. Barrett, Colchester, VT (US);

Kevin W. Collins, Essex Junction, VT (US);

Daniel B. Sullivan, Edina, MN (US);

Inventors:

Monica J. Barrett, Colchester, VT (US);

Kevin W. Collins, Essex Junction, VT (US);

Daniel B. Sullivan, Edina, MN (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03F 1/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method includes determining defect types and defect locations on a mask blank and storing the defect types and the defect locations. The method further includes generating at least one alignment mark on the mask blank and selecting a mask pattern for the mask blank based on the defect types and the defect locations. Additionally, the method includes determining a positioning of the mask pattern on the mask blank, aligning a mask pattern generator with the mask blank in accordance with the positioning using the at least one alignment mark and forming the mask pattern on the mask blank using the mask pattern generator.


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