Colchester, VT, United States of America

Monica J Barrett


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Innovations by Monica J Barrett

Introduction

Monica J Barrett is an accomplished inventor based in Colchester, Vermont. She has made significant contributions to the field of technology, particularly in the area of mask substrate defect tolerance. Her innovative approach has led to the development of a unique method that enhances the precision and reliability of mask patterns.

Latest Patents

Monica holds a patent for her invention titled "Pre-alignment marking and inspection to improve mask substrate defect tolerance." This method involves determining defect types and locations on a mask blank, storing this information, and generating alignment marks. The process further includes selecting a mask pattern based on the identified defects and aligning a mask pattern generator accordingly. This invention is crucial for improving the quality and efficiency of mask production.

Career Highlights

Monica is currently employed at International Business Machines Corporation, commonly known as IBM. Her work at IBM has allowed her to collaborate with leading experts in the field and contribute to groundbreaking projects. She has demonstrated exceptional skill and dedication throughout her career.

Collaborations

Monica has worked alongside notable colleagues, including Kevin W Collins and Daniel Boyd Sullivan. Their collaborative efforts have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Monica J Barrett is a pioneering inventor whose work has significantly impacted technology and mask production. Her innovative methods and dedication to her craft continue to inspire others in the industry.

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