The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2005
Filed:
Apr. 28, 2004
Edward W. Conrad, Jeffersonville, VT (US);
Craig E. Schneider, Underhill, VT (US);
John S. Smyth, Milton, VT (US);
Daniel B. Sullivan, Milton, VT (US);
Edward W. Conrad, Jeffersonville, VT (US);
Craig E. Schneider, Underhill, VT (US);
John S. Smyth, Milton, VT (US);
Daniel B. Sullivan, Milton, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A system and method for optimizing metrology sampling rates in an advanced process control (APC) application. A method is provided for processing a run of workpieces, the method comprising the steps of: providing a database comprising subgroups of data representing characteristics from previously processed workpieces; selecting a first subgroup of data having characteristics that satisfy a predetermined criteria; determining processing conditions for a processing tool corresponding to said first subgroup of data; processing the run of workpieces with the process tool using the determined processing conditions; and measuring the run of workpieces according to a sampling rate determined from the first subgroup of data.