The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Apr. 02, 2008
Brian Neal Caldwell, Milton, VT (US);
Daniel Boyd Sullivan, Edina, MN (US);
Raymond Walter Jeffer, South Burlington, VT (US);
Brian Neal Caldwell, Milton, VT (US);
Daniel Boyd Sullivan, Edina, MN (US);
Raymond Walter Jeffer, South Burlington, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention comprises a system, software, and method for the treatment of mask data that produces defects in resultant images produced in the fabrication of a mask, following identification of the defects. The invention involves identifying each exposure shot with certain information which when combined with similar information related to the defects is used to control the exposure tool to toggle or modulate the shots related to the defects and thus, eliminate the defects.