Location History:
- Milton, VT (US) (2007 - 2013)
- Meridian, ID (US) (2016 - 2018)
Company Filing History:
7 out of 164,219 
3 out of 1,268 
Years Active: 2007-2018
Title: Brian Neal Caldwell: Innovator in Photomask Technology
Introduction
Brian Neal Caldwell is a notable inventor based in Milton, VT (US). He has made significant contributions to the field of photomask technology, holding a total of 7 patents. His work focuses on improving the evaluation and design of photomasks, which are essential in the semiconductor manufacturing process.
Latest Patents
Caldwell's latest patents include a test pattern layout for a test photomask and a method for evaluating critical dimension changes. This invention relates to a test photomask that features a plurality of cells with a varied density pattern. The design includes two groups of cells arranged along different lines, each having a specific combined density ratio. Notably, the varied density pattern is engineered to substantially neutralize fogging effects, enhancing the reliability of photomask evaluations.
Career Highlights
Throughout his career, Caldwell has worked with prominent companies such as IBM and Toppan Printing Co., Ltd. His experience in these organizations has allowed him to refine his expertise in photomask technology and contribute to advancements in the field.
Collaborations
Caldwell has collaborated with notable individuals in his field, including Raymond Walter Jeffer and Steven C Nash. These partnerships have likely enriched his work and led to innovative solutions in photomask technology.
Conclusion
Brian Neal Caldwell is a distinguished inventor whose contributions to photomask technology have made a significant impact in the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing this critical field.