Brian Neal Caldwell

This inventor holds 7 USPTO granted patents. Top assignees: International Business Machines Corporation, Toppan Printing Co., Ltd.. Active years: 2007-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Brian Neal Caldwell. Retrieved from https://idiyas.com/inventor/brian-neal-caldwell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 15(Granted Patents)

Location History:

Milton, VT (US) (2007 - 2013)
Meridian, ID (US) (2016 - 2018)

Company Filing History:

7 out of 166,351

International Business Machines Corporation

patents

3 out of 1,269

Toppan Printing Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2007-2018

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7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9996000 - Test pattern layout for test photomask and method for evaluating critical dimension changes (2018-06-12),

2. 9989843 - Test pattern layout for test photomask and method for evaluating critical dimension changes (2018-06-05),

3. 9372394 - Test pattern layout for test photomask and method for evaluating critical dimension changes (2016-06-21),

4. 8586950 - Method and system for feature function aware priority printing (2013-11-19),

5. 8227774 - Method and system for feature function aware priority printing (2012-07-24),

6. 7496885 - Method of compensating for defective pattern generation data in a variable shaped electron beam system (2009-02-24),

7. 7198276 - Adaptive electrostatic pin chuck (2007-04-03),

Title: Brian Neal Caldwell: Innovator in Photomask Technology

Introduction

Brian Neal Caldwell is a notable inventor based in Milton, VT (US). He has made significant contributions to the field of photomask technology, holding a total of 7 patents. His work focuses on improving the evaluation and design of photomasks, which are essential in the semiconductor manufacturing process.

Latest Patents

Caldwell's latest patents include a test pattern layout for a test photomask and a method for evaluating critical dimension changes. This invention relates to a test photomask that features a plurality of cells with a varied density pattern. The design includes two groups of cells arranged along different lines, each having a specific combined density ratio. Notably, the varied density pattern is engineered to substantially neutralize fogging effects, enhancing the reliability of photomask evaluations.

Career Highlights

Throughout his career, Caldwell has worked with prominent companies such as IBM and Toppan Printing Co., Ltd. His experience in these organizations has allowed him to refine his expertise in photomask technology and contribute to advancements in the field.

Collaborations

Caldwell has collaborated with notable individuals in his field, including Raymond Walter Jeffer and Steven C Nash. These partnerships have likely enriched his work and led to innovative solutions in photomask technology.

Conclusion

Brian Neal Caldwell is a distinguished inventor whose contributions to photomask technology have made a significant impact in the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing this critical field.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]