The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
Jan. 07, 2010
Brian N. Caldwell, Milton, VT (US);
Emily E. F. Gallagher, Burlington, VT (US);
Steven C. Nash, Essex Junction, VT (US);
Jed H. Rankin, Richmond, VT (US);
Brian N. Caldwell, Milton, VT (US);
Emily E. F. Gallagher, Burlington, VT (US);
Steven C. Nash, Essex Junction, VT (US);
Jed H. Rankin, Richmond, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and system for photomask pattern generation is provided, and more specifically, a method and system for feature function aware priority printing is provided. The method of printing a photolithographic mask includes fracturing mask design data into write shapes that are multiples of a spot size and passing fractured mask design data to a write tool. Additionally, the method includes writing one or more non-critical shapes according to one or more time-saving rules.