Raymond Walter Jeffer

Title: Innovations of Raymond Walter Jeffer

Introduction

Raymond Walter Jeffer is a notable inventor based in South Burlington, VT (US). He has made significant contributions to the field of photomask technology, holding a total of 5 patents. His work focuses on enhancing the evaluation processes in photomasks, which are critical in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Test pattern layout for test photomask and method for evaluating critical dimension changes." This invention relates to a test photomask and a method for assessing critical dimension changes within it. The test photomask comprises a plurality of cells with a varied density pattern. These cells are organized into two groups along different lines, each with a specific combined density ratio. Notably, the varied density pattern is designed to effectively neutralize fogging effects, which is crucial for maintaining the integrity of photomask evaluations.

Career Highlights

Throughout his career, Raymond has worked with prominent companies such as IBM and Toppan Printing Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in photomask technology.

Collaborations

Raymond has collaborated with talented individuals in his field, including Brian Neal Caldwell and Yuki Fujita. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Raymond Walter Jeffer's contributions to photomask technology through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in semiconductor manufacturing processes.