logo

For the Inventor, By the Inventor

Gunpo-si, South Korea

Dae-youp Lee

USPTO Granted Patents = 12

Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 69(Granted Patents)


Location History:

  • Kunpo, KR (2003)
  • Gunpo, KR (2004)
  • Kyungki-do, KR (2005)
  • Gunpo-si, KR (2003 - 2013)
  • Gyeonggi-do, KR (2006 - 2013)

Company Filing History:

goldMedal12 out of 131,611 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2003-2013

Loading Chart...
12 patents (USPTO):Explore Patents
1. 8546258 - Method of fabricating metal contact using double patterning technology and device formed thereby (2013-10-01),
2. 8384876 - Method of detecting reticle errors (2013-02-26),
3. 8361905 - Methods of forming patterns for semiconductor devices (2013-01-29),
4. 8241820 - Photomask used in fabrication of semiconductor device (2012-08-14),
5. 8227354 - Method of forming semiconductor device patterns (2012-07-24),
6. 7083899 - Method for manufacturing a semiconductor device (2006-08-01),
7. 6933247 - Method for forming a minute pattern and method for manufacturing a semiconductor device using the same (2005-08-23),
8. 6841338 - Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio (2005-01-11),
9. 6818480 - Method of forming a pattern of a semiconductor device and photomask therefor (2004-11-16),
10. 6673706 - Method of forming a pattern using a photoresist without exposing the photoresist and silicidation method incorporating the same (2004-01-06),
11. 6620690 - Method of fabricating flash memory device using self-aligned non-exposure pattern formation process (2003-09-16),
12. 6571384 - Method of forming fine patterns on semiconductor device (2003-05-27),

Title: Innovations of Dae-youp Lee

Introduction

Dae-youp Lee is a prominent inventor based in Gunpo-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on improving manufacturing processes and enhancing the performance of semiconductor devices.

Latest Patents

One of Dae-youp Lee's latest patents is a method of fabricating metal contacts using double patterning technology. This innovative process allows for the reduction of a string overhead area, which in turn decreases the chip size of semiconductor devices. The method involves forming a first mask pattern by etching a first mask layer, which includes openings in both the cell and peripheral regions. Additionally, he has developed a method of detecting reticle errors, which utilizes an optical source to detect errors at a wafer level by analyzing changes in a photoresist film.

Career Highlights

Dae-youp Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His expertise and innovative approaches have made him a valuable asset to the company and the industry as a whole.

Collaborations

Some of Dae-youp Lee's notable coworkers include Bong-cheol Kim and Jeung-woo Lee. Their collaborative efforts contribute to the advancement of technology within their field.

Conclusion

Dae-youp Lee's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a leading inventor in the industry. His innovative methods are paving the way for future advancements in semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…