The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Jul. 14, 2009
Jin-seok Heo, Suwon-si, KR;
Jin-hong Park, Hwaseong-si, KR;
Dae-youp Lee, Gunpo-si, KR;
Jeong-ho Yeo, Suwon-si, KR;
Jin-seok Heo, Suwon-si, KR;
Jin-hong Park, Hwaseong-si, KR;
Dae-youp Lee, Gunpo-si, KR;
Jeong-ho Yeo, Suwon-si, KR;
Samsung Electronics, Co., Ltd., Gyeonggi-Do, KR;
Abstract
A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0diffraction light from among diffraction lights transmitted through the reticle. A method of detecting reticle error may include: installing a reticle, including a mask substrate and mask patterns having a critical dimension formed on the mask substrate, in an exposure unit to cause light to be incident on the reticle; exposing a photoresist film disposed on a wafer in the exposure unit using only 0diffraction light from among diffraction lights transmitted through the reticle; developing the exposed photoresist film; and analyzing a thickness change, an image, or the thickness change and image of the developed photoresist film, in order to detect the reticle error at a wafer level.