The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Jun. 17, 2002
Applicants:
Dae-youp Lee, Kyungki-do, KR;
Jeong-lim Nam, Kyungki-do, KR;
Do-yul Yoo, Seoul, KR;
Jeung-woo Lee, Kyungki-do, KR;
Inventors:
Dae-youp Lee, Kyungki-do, KR;
Jeong-lim Nam, Kyungki-do, KR;
Do-yul Yoo, Seoul, KR;
Jeung-woo Lee, Kyungki-do, KR;
Assignee:
Samsung Electronics Co. Ltd., , KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 500 ;
U.S. Cl.
CPC ...
Abstract
A photoresist composition may include formulas 1 and 2: A method for forming photoresist patterns may include forming a photoresist layer on a semiconductor substrate and exposing and developing the photoresist layer using a mask pattern that includes first areas having a light transmissivity of about 100% and second areas having a light transmissivity of between about 10% and about 30%.