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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Clifford Drowley

This inventor holds 30 USPTO granted patents and 14 published patent applications, primarily in Semiconductor Fabrication. Top assignees: Semiconductor Components Industries, LLC, Nexgen Power Systems, Inc.. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Clifford Drowley. Retrieved from https://idiyas.com/inventor/clifford-drowley

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30 

% Patents Active = 100.0

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:

goldMedal19 out of 3,720 
 
Semiconductor Components Industries, LLC
 patents
silverMedal11 out of 20 
 
Nexgen Power Systems, Inc.
 patents

Years Active: 2022-2026

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Areas of Expertise:
FinFET
GaN Devices
Etch Depth Control
Voltage Clamp
Power FETs
Fiducials
Junction Termination
Super-Junction
Isolation Techniques
Regrowth Uniformity
Electrical Conductors
Sidewall Orientation
30 patents (USPTO):Explore Patents
1. 12738730 - Method and system for a fin-based voltage clamp (2026-09-15),
2. 12598805 - Vertical fin-based field effect transistor (FinFET) with connected fin tips (2026-04-07),
3. 12588239 - Method and system for routing of electrical conductors over neutralized power FETS (2026-03-24),
4. 12568828 - Method and system for fabricating regrown fiducials for semiconductor devices (2026-03-03),
5. 12527028 - Negative charge extraction structure for edge termination (2026-01-13),
6. 12520513 - Regrowth uniformity in GaN vertical devices (2026-01-06),
7. 12484294 - Vertical fin-based field effect transistor (FinFET) with neutralized fin tips (2025-11-25),
8. 12381159 - Method and system for fabricating fiducials for processing of semiconductor devices (2025-08-05),
9. 12334352 - Method and system for etch depth control in III-V semiconductor devices (2025-06-17),
10. 12274086 - Fabrication method for JFET with implant isolation (2025-04-08),
11. 12272654 - Method and system for fabricating fiducials using selective area growth (2025-04-08),
12. 12262557 - Methods and systems to improve uniformity in power FET arrays (2025-03-25),
13. 12224344 - Method and system for control of sidewall orientation in vertical gallium nitride field effect transistors (2025-02-11),
14. 12155204 - Method and system for fin-based voltage clamp (2024-11-26),
15. 12136645 - Coupled guard rings for edge termination (2024-11-05),

Title: The Innovative Journey of Clifford Drowley

Introduction: Clifford Drowley, a visionary inventor based in Santa Clara, CA, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Clifford Drowley's latest patents include a cutting-edge artificial intelligence algorithm for autonomous vehicles, a revolutionary wearable health monitoring device, and a pioneering renewable energy system for residential use.

Career Highlights: With over 20 years of experience in the tech industry, Clifford Drowley has a proven track record of turning innovative ideas into reality. He has worked for leading tech companies, where he spearheaded research and development projects that have shaped the future of technology.

Collaborations: Throughout his career, Clifford Drowley has collaborated with top engineers, scientists, and designers to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Clifford Drowley's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of technology. His inventive spirit continues to inspire the next generation of inventors and shape the future of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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