Location History:
- Hachioji, JP (1982 - 1983)
- Tokorozawa, JP (1984 - 1997)
Company Filing History:
13 out of 42,508 
2 out of 374 
Years Active: 1982-1997
Title: Chushirou Kusano: Innovator in Semiconductor Technology
Introduction
Chushirou Kusano is a prominent inventor based in Tokorozawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His innovative work has paved the way for advancements in semiconductor devices and etching methods.
Latest Patents
One of Kusano's latest patents is a semiconductor device that comprises a semiconductor substrate formed by a first single crystalline semiconductor material. This device features semiconductor layers formed on the substrate by a second single crystalline semiconductor material, which is doped with an element that can easily surface segregate. The surface of the semiconductor substrate is designed to be substantially equivalent to a facet plane formed on the surface of the second single crystalline semiconductor material when it is epitaxially grown on a (100) plane of the first single crystalline semiconductor material.
Another notable patent is for a method and apparatus for etching compound semiconductors. This method involves substituting a composite element of a compound semiconductor with another element, thereby forming a compound layer on the surface. The etching depth is controlled not by etching time, but by the number of repetitions of the etching step, allowing for precise control over the etching process.
Career Highlights
Throughout his career, Chushirou Kusano has worked with esteemed companies such as Hitachi, Ltd. and Nippon Hoso Kyokai. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Kusano has collaborated with notable coworkers, including Yukio Takasaki and Tomonori Tanoue. Their joint efforts have further advanced the field of semiconductor research and development.
Conclusion
Chushirou Kusano's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor devices and etching methods.