Kaohsiung, Taiwan

Chun-Kai Chen

USPTO Granted Patents = 9 

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2017-2025

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9 patents (USPTO):Explore Patents

Title: Innovations of Chun-Kai Chen

Introduction

Chun-Kai Chen is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of nine patents. His work focuses on advanced methods for forming interconnect structures and lithography patterning, which are crucial for the fabrication of semiconductor devices.

Latest Patents

One of Chun-Kai Chen's latest patents is a method for forming an interconnect structure. This method involves depositing a first dielectric layer over a first conductive feature, followed by the application of a first and second mask layer. The process includes patterning openings in these layers, with specific widths that facilitate the exposure of the conductive feature. Another notable patent is related to a method for semiconductor device fabrication, which includes forming a target layer over a substrate and creating a patterning layer with an organic composition and a silicon-rich layer. This innovative approach utilizes advanced deposition techniques such as ALD, CVD, or PVD.

Career Highlights

Chun-Kai Chen works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative methods have contributed to the company's advancements in semiconductor technology. His patents reflect a deep understanding of the complexities involved in semiconductor fabrication.

Collaborations

Chun-Kai Chen has collaborated with notable colleagues, including Tze-Liang Lee and Jung-Hau Shiu. These collaborations have likely enhanced the development of his innovative methods and contributed to the success of their projects.

Conclusion

Chun-Kai Chen is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His innovative patents and collaborations with esteemed colleagues underscore his impact on the industry.

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