Location History:
- Hsinchu Science Park, TW (2018)
- Hsinchu, TW (2018 - 2023)
Company Filing History:
Years Active: 2018-2023
Title: Innovations of Chun-I Fan
Introduction
Chun-I Fan is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of eight patents. His work focuses on the manufacturing processes of epitaxy substrates, which are crucial for various electronic applications.
Latest Patents
Chun-I Fan's latest patents include a method of manufacturing an epitaxy substrate. This method involves providing a handle substrate and performing a beveling treatment on the edge of a device substrate. The device substrate has a thickness greater than 100 micrometers and less than 200 micrometers. An ion implantation process is conducted on the first surface of the device substrate to create an implantation region. The second surface of the device substrate is then bonded to the handle substrate, ensuring a bonding angle greater than 90 degrees between the bevel of the device substrate and the handle substrate. The projection length of the bevel toward the handle substrate ranges between 600 micrometers and 800 micrometers. Another patent focuses on an epitaxy substrate that includes a silicon substrate and a silicon carbide layer, with specific distances maintained between the silicon carbide layer and the epitaxy surface.
Career Highlights
Chun-I Fan has worked with notable companies in the semiconductor industry, including GlobalWafers Co., Ltd. and Sino-American Silicon Products Inc. His experience in these organizations has contributed to his expertise in the field and the development of his innovative patents.
Collaborations
Chun-I Fan has collaborated with several professionals in his field, including Chih-Yuan Chuang and Wen-Ching Hsu. These collaborations have likely enhanced his research and development efforts, leading to successful innovations.
Conclusion
Chun-I Fan is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the manufacturing of epitaxy substrates. His contributions are vital to the ongoing evolution of electronic components.