logo

For the Inventor, By the Inventor

Newburyport, MA, United States of America

Christopher W Campbell

This inventor holds 26 USPTO granted patents and 7 published patent applications, primarily in Ion Beam Technology. Top assignees: Varian Semiconductor Equipment Associates, Inc., Applied Materials, Inc.. Active years: 2009-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christopher W Campbell. Retrieved from https://idiyas.com/inventor/christopher-w-campbell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 26 

% Patents Active = 100.0

Average Co-Inventor Count = 5.4

ph-index = 5

Forward Citations = 55(Granted Patents)


Company Filing History:

goldMedal17 out of 916 
 
Varian Semiconductor Equipment Associates, Inc.
 patents
silverMedal9 out of 14,523 
 
Applied Materials, Inc.
 patents

Years Active: 2009-2026

Loading Chart...
Areas of Expertise:
Ion Extraction Optics
High-Angle Extraction
Photoresist Outgassing
Substrate Treatment
Directional Plasma
Ion Beam Control
Capacitively Coupled Components
Radio Frequency Extraction
In-Situ Cleaning
Patterned Structures
Collimator Magnet
Neutral Filter Magnet
26 patents (USPTO):Explore Patents
1. D1120442 - Ion extraction optics having novel blocker configuration (2026-03-24),
2. 12406833 - Ion extraction optics having non uniform grid assembly (2025-09-02),
3. 12400824 - Ion extraction optics having novel blocker configuration (2025-08-26),
4. 12106943 - Substrate halo arrangement for improved process uniformity (2024-10-01),
5. 11948781 - Apparatus and system including high angle extraction optics (2024-04-02),
6. 11749500 - Real time photoresist outgassing control system and method (2023-09-05),
7. 11361935 - Apparatus and system including high angle extraction optics (2022-06-14),
8. 11056319 - Apparatus and system having extraction assembly for wide angle ion beam (2021-07-06),
9. 11011343 - High-current ion implanter and method for controlling ion beam using high-current ion implanter (2021-05-18),
10. 10730082 - Apparatus and method for differential in situ cleaning (2020-08-04),
11. 10714301 - Conductive beam optics for reducing particles in ion implanter (2020-07-14),
12. 10600616 - Apparatus and techniques to treat substrates using directional plasma and point of use chemistry (2020-03-24),
13. 10504682 - Conductive beam optic containing internal heating element (2019-12-10),
14. 10276340 - Low particle capacitively coupled components for workpiece processing (2019-04-30),
15. 10224181 - Radio frequency extraction system for charge neutralized ion beam (2019-03-05),

Title: The Inventor Profile of Christopher W Campbell

Introduction:

Christopher W Campbell is a distinguished inventor based in Newburyport, Massachusetts. With a passion for innovation and problem-solving, he has made significant contributions to the field of technology through his inventive spirit and dedication.

Latest Patents:

Christopher W Campbell holds several patents in various technological domains, showcasing his versatility and creativity in developing novel solutions to complex challenges. His recent patents focus on cutting-edge advancements in the fields of robotics and artificial intelligence.

Career Highlights:

Throughout his career, Christopher W Campbell has demonstrated a remarkable ability to translate ideas into tangible inventions that have the potential to shape the future. His innovative approach and technical expertise have earned him recognition as a leading figure in the innovation landscape.

Collaborations:

Christopher W Campbell has collaborated with top research institutions and technology companies to bring his inventions to life. His partnerships have been instrumental in driving forward groundbreaking projects and pushing the boundaries of technological innovation.

Conclusion:

In conclusion, Christopher W Campbell stands out as a visionary inventor who continues to push the envelope of what is possible in the world of technology. His relentless pursuit of innovation and commitment to excellence make him a true pioneer in his field, inspiring others to think creatively and strive for greatness.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…