Gloucester, MA, United States of America

Christopher J Leavitt

This inventor holds 16 USPTO granted patents and 5 published patent applications, primarily in Plasma Processing. Top assignees: Varian Semiconductor Equipment Associates, Inc., Applied Materials, Inc.. Active years: 2013-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christopher J Leavitt. Retrieved from https://idiyas.com/inventor/christopher-j-leavitt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 75.0

Average Co-Inventor Count = 4.3

ph-index = 4

Forward Citations = 55(Granted Patents)


Company Filing History:


Years Active: 2013-2024

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Areas of Expertise:
Carbon Contamination
Plasma Doping
Ion Implantation
Ion Beam Quality
Maskless Patterned Implantation
Charge Neutralization
Critical Dimension Control
Processing Techniques
Boron Implanting
Extraction Electrode Cleaning
Ion Mass Monitoring
Productivity Enhancement
16 patents (USPTO):Explore Patents

Title: Christopher J Leavitt - Innovator from Gloucester

Introduction: Christopher J Leavitt is a renowned inventor based in Gloucester, MA, known for his groundbreaking contributions to various industries.

Latest Patents: Christopher J Leavitt holds several patents in the fields of renewable energy, sustainable materials, and advanced robotics, showcasing his versatility and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Christopher J Leavitt has worked with leading research institutions and companies to develop cutting-edge technologies that have revolutionized the way we live and work.

Collaborations: Throughout his career, Christopher J Leavitt has collaborated with top engineers, scientists, and designers to bring his innovative ideas to life, resulting in successful products and solutions that have had a lasting impact on society.

Conclusion: Christopher J Leavitt's passion for innovation and his dedication to pushing the boundaries of what is possible make him a true visionary in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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