The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2023

Filed:

Aug. 13, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Vikram M. Bhosle, North Reading, MA (US);

Christopher J. Leavitt, Gloucester, MA (US);

Guillermo Colom, Salisbury, MA (US);

Timothy J. Miller, Ipswich, MA (US);

Assignee:

APPLIED Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/32 (2006.01); H01L 21/265 (2006.01); C23C 14/48 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32412 (2013.01); C23C 14/48 (2013.01); H01J 37/3171 (2013.01); H01L 21/265 (2013.01);
Abstract

An apparatus may include a main chamber, a substrate holder, disposed in a lower region of the main chamber, and defining a substrate region, as well as an RF applicator, disposed adjacent an upper region of the main chamber, to generate an upper plasma within the upper region. The apparatus may further include a central chamber structure, disposed in a central portion of the main chamber, where the central chamber structure is disposed to shield at least a portion of the substrate position from the upper plasma. The apparatus may include a bias source, electrically coupled between the central chamber structure and the substrate holder, to generate a glow discharge plasma in the central portion of the main chamber, wherein the substrate region faces the glow discharge region.


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