The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Nov. 26, 2013
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Peter F. Kurunczi, Cambridge, MA (US);
Bon-Woong Koo, Andover, MA (US);
John A. Frontiero, Rockport, MA (US);
William T. Levay, Rockport, MA (US);
Christopher J. Leavitt, Gloucester, MA (US);
Timothy J. Miller, Ipswich, MA (US);
Vikram M. Bhosle, North Reading, MA (US);
John W. Graff, Swampscott, MA (US);
Nicholas P T Bateman, Reading, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
A method of processing a workpiece is disclosed, where the ion chamber is first coated with the desired dopant species and another species. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant, is introduced to the chamber and ionized. Ions are then extracted from the chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. The other species used during the conditioning process may be a Group 3, 4 or 5 element. The desired dopant species may be boron.