The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Dec. 07, 2011
Peter F. Kurunczi, Cambridge, MA (US);
Christopher J. Leavitt, Gloucester, MA (US);
Daniel Distaso, Merrimac, MA (US);
Timothy J. Miller, Ipswich, MA (US);
Peter F. Kurunczi, Cambridge, MA (US);
Christopher J. Leavitt, Gloucester, MA (US);
Daniel Distaso, Merrimac, MA (US);
Timothy J. Miller, Ipswich, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
A processing system may include a plasma source for providing a plasma and a workpiece holder arranged to receive ions from the plasma. The processing system may further include a pulsed bias circuit electrically coupled to the plasma source and operable to switch a bias voltage supplied to the plasma source between a high voltage state in which the plasma source is biased positively with respect to ground and a low voltage state in which the plasma source is biased negatively with respect to the ground.