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For the Inventor, By the Inventor

Aloha, OR, United States of America

Christopher D Thomas

USPTO Granted Patents = 11 

Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 476(Granted Patents)


Location History:

  • Aloha, OR (US) (2003 - 2011)
  • Portland, OR (US) (2023)

Company Filing History:

goldMedal11 out of 54,781 
 
Intel Corporation
 patents

Years Active: 2003-2023

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11 patents (USPTO):Explore Patents
1. 11769686 - Methods and apparatus for electroless plating dispense (2023-09-26),
2. 7883951 - CMOS device with metal and silicide gate electrodes and a method for making it (2011-02-08),
3. 7320935 - Semiconductor device using an interconnect (2008-01-22),
4. 7220635 - Method for making a semiconductor device with a metal gate electrode that is formed on an annealed high-k gate dielectric layer (2007-05-22),
5. 7153734 - CMOS device with metal and silicide gate electrodes and a method for making it (2006-12-26),
6. 7001641 - Seed layer treatment (2006-02-21),
7. 6977224 - Method of electroless introduction of interconnect structures (2005-12-20),
8. 6843852 - Apparatus and method for electroless spray deposition (2005-01-18),
9. 6733679 - Method of treating an electroless plating waste (2004-05-11),
10. 6696758 - Interconnect structures and a method of electroless introduction of interconnect structures (2004-02-24),
11. 6605874 - Method of making semiconductor device using an interconnect (2003-08-12),

Title: Innovations of Christopher D Thomas

Introduction

Christopher D Thomas is a notable inventor based in Aloha, OR (US). He has made significant contributions to the field of semiconductor technology and plating methods. With a total of 11 patents to his name, Thomas has demonstrated a commitment to advancing innovation in his industry.

Latest Patents

Among his latest patents is a method and apparatus for electroless plating dispense. This invention features a single-substrate electroless (EL) plating apparatus that includes a workpiece chuck, which is rotatable and inclinable. The chuck's inclination can be controlled to enhance the uniformity of surface wetting and the residence time of the plating solution. The design allows for active control of the inclination angle during the dispense process, optimizing the plating results. Another significant patent involves a CMOS device with metal and silicide gate electrodes, along with a method for its formation. This semiconductor device comprises a metal NMOS gate electrode and a silicide PMOS gate electrode, showcasing Thomas's expertise in semiconductor fabrication.

Career Highlights

Christopher D Thomas is currently employed at Intel Corporation, a leading company in the technology sector. His work at Intel has allowed him to contribute to cutting-edge advancements in semiconductor technology.

Collaborations

Thomas has collaborated with notable colleagues, including Valery M Dubin and Justin K Brask, further enhancing the innovative environment in which he works.

Conclusion

Christopher D Thomas is a distinguished inventor whose work has significantly impacted the fields of semiconductor technology and plating methods. His innovative patents and contributions to Intel Corporation highlight his role as a leader in technological advancements.

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