The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2005
Filed:
Dec. 28, 2000
Valery M. Dubin, Portland, OR (US);
Christopher D. Thomas, Aloha, OR (US);
Paul Mcgregor, Hillsboro, OR (US);
Madhav Datta, Portland, OR (US);
Valery M. Dubin, Portland, OR (US);
Christopher D. Thomas, Aloha, OR (US);
Paul McGregor, Hillsboro, OR (US);
Madhav Datta, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A method comprising introducing an interconnect structure in an opening through a dielectric over a contact point, and introducing a conductive shunt material through a chemically-induced oxidation-reduction reaction. A method comprising introducing an interconnect structure in an opening through a dielectric over a contact point, introducing a conductive shunt material having an oxidation number over an exposed surface of the interconnect structure, and reducing the oxidation number of the shunt. An apparatus comprising a substrate comprising a device having contact point, a dielectric layer overlying the device with an opening to the contact point, and an interconnect structure disposed in the opening comprising an interconnect material and a different conductive shunt material.