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For the Inventor, By the Inventor

Jena, Germany

Christoph Husemann

This inventor holds 24 USPTO granted patents and 4 published patent applications and 7 EPO patents, primarily in Photolithography Processes. Top assignees: Carl Zeiss Smt Gmbh, Carl Zeiss Microscopy Gmbh, Carl Zeiss Ag. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christoph Husemann. Retrieved from https://idiyas.com/inventor/christoph-husemann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 33(Granted Patents)


Company Filing History:

goldMedal13 out of 1,479 
 
Carl Zeiss Smt Gmbh
 patents
silverMedal10 out of 756 
 
Carl Zeiss Microscopy Gmbh
 patents
bronzeMedal1 out of 222 
 
Carl Zeiss Ag
 patents
4. 1 out of 240 
 
Carl Zeiss Industrielle Messtechnik Gmbh
 patents
where one patent can have more than one assignee

Years Active: 2018-2026

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Areas of Expertise:
Photolithography
Image Analysis
Defect Localization
Beam Analysis
3D Measurements
Light Modulation
Contrast Imaging
Optical Devices
Microscopy
Stereoscopic Imaging
Reflection-Reduced Contrast
Transformation Model
24 patents (USPTO):Explore Patents
1. 12560864 - Method for ascertaining an image of an object (2026-02-24),
2. 12345864 - Apparatus and method for manipulating a focus of excitation light on or in a sample and microscope (2025-07-01),
3. 12335614 - Method and device for determining the optimal position of the focal plane for examining a specimen by microscopy (2025-06-17),
4. 12307334 - Method and device for evaluating a statistically distributed measured value in the examination of an element of a photolithography process (2025-05-20),
5. 12111579 - Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process (2024-10-08),
6. 12001145 - Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model (2024-06-04),
7. 11892769 - Method for detecting an object structure and apparatus for carrying out the method (2024-02-06),
8. 11774859 - Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process (2023-10-03),
9. 11442263 - Method and devices for displaying stereoscopic images (2022-09-13),
10. 11079338 - Method for detecting a structure of a lithography mask and device for carrying out the method (2021-08-03),
11. 11054305 - Method and device for beam analysis (2021-07-06),
12. 10788748 - Method and appliance for predicting the imaging result obtained with a mask when a lithography process is carried out (2020-09-29),
13. 10670387 - Determining the position of an object in the beam path of an optical device (2020-06-02),
14. 10634886 - Method for three-dimensionally measuring a 3D aerial image of a lithography mask (2020-04-28),
15. 10620417 - Method for generating a reflection-reduced contrast image and corresponding device (2020-04-14),

Title: The Innovative Journey of Christoph Husemann: Inspiring the Next Generation of Technology

Introduction:

Christoph Husemann, a visionary inventor based in Jena, Germany, has made significant contributions to the field of technology with his passion for innovation and pursuit of excellence. With 19 patents to his name, Husemann continues to inspire the next generation of inventors and entrepreneurs with his groundbreaking work in the ever-evolving world of technology.

Latest Patents:

Among his latest patents is the "Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model." This innovative apparatus includes a transformation model trained using a multitude of data for accurate analysis. Another notable patent is the "Method for detecting an object structure and apparatus for carrying out the method," which showcases Husemann's mastery in reconstructing object structures using an iterative method for precise detection.

Career Highlights:

Husemann's exceptional career has seen him excel at renowned companies such as Carl Zeiss SMT GmbH and Carl Zeiss Microscopy GmbH. His innovative spirit and dedication to technological advancement have been instrumental in shaping the future of the industry. His relentless pursuit of excellence sets him apart as a true pioneer in the field of technology.

Collaborations:

Throughout his career, Husemann has collaborated with talented individuals such as Lars Stoppe and Ulrich Matejka. These collaborations have not only fostered innovation but have also led to the development of groundbreaking technologies that have had a lasting impact on the industry.

Conclusion:

In conclusion, Christoph Husemann's unwavering dedication to innovation and his remarkable achievements in the field of technology continue to inspire and influence the next generation of inventors and entrepreneurs. His inventive spirit and commitment to excellence serve as a beacon for those striving to make a difference in the ever-evolving world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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