The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Nov. 25, 2019
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Matthias Manger, Aalen-Unterkochen, DE;

Christoph Husemann, Jena, DE;

Matus Kalisky, Aalen, DE;

Lars Stoppe, Jena, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/04 (2014.01); G01J 1/42 (2006.01); G01J 1/04 (2006.01); G02B 27/10 (2006.01); B23K 26/03 (2006.01); B23K 26/70 (2014.01);
U.S. Cl.
CPC ...
G01J 1/4257 (2013.01); B23K 26/032 (2013.01); B23K 26/04 (2013.01); B23K 26/705 (2015.10); G01J 1/0407 (2013.01); G01J 1/0411 (2013.01); G01J 1/0418 (2013.01); G02B 27/106 (2013.01); G02B 27/1086 (2013.01);
Abstract

A method and an apparatus for beam analysis in an optical system are disclosed, wherein a plurality of beam parameters of a beam propagating along an optical axis are ascertained. The method includes: splitting the beam into a plurality of partial beams which have a focus offset in the longitudinal direction in relation to the optical axis; recording a measurement image produced by these partial beams; carrying out a forward simulation of the beam in the optical system on the basis of estimated initial values for the beam parameters in order to obtain a simulated image; and calculating a set of values for the beam parameters on the basis of the comparison between the simulated image and the measurement image.


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