The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Jan. 04, 2021
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Dirk Seidel, Jena-Leutra, DE;

Alexander Freytag, Erfurt, DE;

Christian Wojek, Aalen, DE;

Susanne Töpfer, Gleina, DE;

Carsten Schmidt, Jena, DE;

Christoph Husemann, Jena, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/20 (2019.01); G03F 7/00 (2006.01); G06F 17/18 (2006.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); G03F 7/705 (2013.01); G06F 17/18 (2013.01); G06N 20/20 (2019.01);
Abstract

The present invention relates to a method for evaluating a statistically distributed measured value in the examination of an element for a photolithography process, comprising the following steps: (a) using a plurality of parameters in a trained machine learning model, wherein the parameters characterize a state of a measurement environment in a time period assigned to a measurement of the measured value; and (b) executing the trained machine learning model in order to evaluate the measured value.


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