Christine Y Ouyang

Title: Christine Y Ouyang: Innovator in Semiconductor Technology

Introduction

Christine Y Ouyang is a prominent inventor based in Hsinchu, Taiwan. She has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. Her innovative work focuses on methods that enhance the manufacturing processes in the semiconductor industry.

Latest Patents

Among her latest patents are several groundbreaking methods. One such patent is for a method for removing a resist layer. This method involves forming a resist layer with a material that comprises a metal oxide core with organic ligands. A chlorine-containing compound or a methyl group-containing compound is applied to the resist layer, allowing for a ligand exchange process that facilitates the removal of the resist layer through sublimation. Another notable patent is related to ultraviolet radiation activated atomic layer deposition. This method fabricates a semiconductor structure by forming an opening and depositing a metal layer within it. The process includes multiple deposition cycles, utilizing a first precursor and subjecting it to ultraviolet radiation, followed by purging to remove excess materials.

Career Highlights

Christine currently works at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. Her expertise and innovative approaches have positioned her as a key player in advancing semiconductor manufacturing techniques.

Collaborations

Christine collaborates with talented colleagues, including Ziwei Fang and Li-Te S Lin. Their combined efforts contribute to the ongoing advancements in semiconductor technology.

Conclusion

Christine Y Ouyang's contributions to semiconductor technology through her patents and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight her role as a leading innovator in the field. Her methods for improving manufacturing processes are paving the way for future advancements in the industry.