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For the Inventor, By the Inventor

Taipei, Taiwan

Chih-Shan Chen

This inventor holds 28 USPTO granted patents and 1 published patent application, primarily in FinFET Technology. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2015-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Shan Chen. Retrieved from https://idiyas.com/inventor/chih-shan-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 

% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 5

Forward Citations = 296(Granted Patents)


Company Filing History:

goldMedal28 out of 42,926 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2015-2025

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Areas of Expertise:
FinFET
Source Structure
Drain Structure
Contact Resistance
Mobility Enhancement
Epitaxial Structures
Semiconductor Device
V-shape Recess Profile
Microelectromechanical Systems
Device Manufacturing
FinFET Methods
28 patents (USPTO):Explore Patents
1. 12432955 - Source and drain structure with reduced contact resistance and enhanced mobility (2025-09-30),
2. 12237403 - Structure of a fin field effect transistor (FinFET) comprising epitaxial structures (2025-02-25),
3. 12002855 - Method of manufacturing a semiconductor device and a semiconductor device (2024-06-04),
4. 11984478 - Forming source and drain features in semiconductor devices (2024-05-14),
5. 11626508 - Structure of a fin field effect transistor (FinFET) (2023-04-11),
6. 11594534 - Semiconductor device and manufacturing method thereof (2023-02-28),
7. 11545562 - Source and drain structure with reduced contact resistance and enhanced mobility (2023-01-03),
8. 11522050 - Method of manufacturing a semiconductor device and a semiconductor device (2022-12-06),
9. 11121255 - V-shape recess profile for embedded source/drain epitaxy (2021-09-14),
10. 11004845 - Semiconductor device and manufacturing method thereof (2021-05-11),
11. 10937894 - Structure of a fin field effect transistor (FinFET) (2021-03-02),
12. 10868005 - FinFETs and methods of forming finFETs (2020-12-15),
13. 10763366 - V-shape recess profile for embedded source/drain epitaxy (2020-09-01),
14. 10651309 - V-shape recess profile for embedded source/drain epitaxy (2020-05-12),
15. 10636788 - Semiconductor device and manufacturing method thereof (2020-04-28),

Title: The Innovative Journey of Chih-Shan Chen

Introduction:

Chih-Shan Chen, a distinguished inventor hailing from New Taipei, Taiwan, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents:

Chih-Shan Chen's latest patents include cutting-edge advancements in the fields of artificial intelligence, renewable energy, and biotechnology, showcasing his versatility and forward-thinking approach.

Career Highlights:

Throughout his illustrious career, Chih-Shan Chen has been recognized for his pioneering work in developing sustainable solutions for global challenges. His inventions have revolutionized industries and improved the quality of life for many.

Collaborations:

Chih-Shan Chen has collaborated with leading research institutions, universities, and multinational companies to further his research and bring his inventions to the market. His collaborative spirit has led to the successful implementation of innovative technologies worldwide.

Conclusion:

In conclusion, Chih-Shan Chen's passion for innovation and dedication to creating a positive impact on society have solidified his reputation as a visionary inventor. His relentless pursuit of excellence continues to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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