Chih-Rong Chen

Title: Innovations of Chih-Rong Chen

Introduction

Chih-Rong Chen is a notable inventor based in Chupei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is the "Method of Fabricating Self-Aligned Silicide." This method involves forming a metal layer on a substrate that includes a polysilicon gate and a source/drain region. A material layer is then applied to produce compressive and tensile stress on the substrate. Following this, a thermal process is executed to create silicide on the polysilicon gate and source/drain region, completing the salicide process.

Another significant patent is the "Method of Manufacturing and Application of Dual Alignment Photomask." This method outlines the steps for creating a dual alignment photomask, which includes depositing a light-blocking layer over a glass plate and patterning it. A switchable mask layer is then added, which can transition between light-passing and light-blocking states based on temperature changes. This innovation allows for cost savings in mask-making and reduces errors from misalignment.

Career Highlights

Chih-Rong Chen has worked with prominent companies in the semiconductor industry, including United Microelectronics Corporation and United Semiconductor Corporation. His experience in these organizations has contributed to his expertise and the development of his patented technologies.

Collaborations

Chih-Rong Chen has collaborated with notable colleagues such as Wen-Yuan Huang and Chi-Chin Yeh. Their combined efforts have further advanced the field of semiconductor technology.

Conclusion

Chih-Rong Chen's innovative patents and career in semiconductor technology highlight his significant contributions to the industry. His work continues to influence advancements in manufacturing processes, showcasing the importance of innovation in technology.