The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2001
Filed:
May. 04, 1999
Chih-Rong Chen, Hsinchu, TW;
Wen-Yuan Huang, Hsinchu Hsien, TW;
Abstract
A method of forming a dual alignment photomask. The method includes the steps of depositing a light-blocking layer over a glass plate, and then patterning the light-blocking layer. Next, a switchable mask layer is deposited over the light-blocking layer and the glass plate, after which the switchable mask layer is patterned. Finally, a protective layer is formed over the switchable mask layer, the light-blocking layer and the glass plate. The switchable mask layer can be changed from a light-passing state to a light-blocking state by simply changing the surrounding temperature. Therefore, through proper setting the temperature, the same photomask can be used to form trenches and vias of dual damascene structures. Thus, some mask-making cost can be saved and errors due to mask misalignment can be avoided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile