Chih-Min Hsiao is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuits, holding a total of 17 patents. His work has been instrumental in advancing technology in semiconductor manufacturing.

Latest Patents

Among his latest patents, Hsiao has developed an integrated circuit and method of forming the same. This integrated circuit features a first active region, a first contact, a first gate, a first conductive line, a first conductor, and a first via. In various embodiments, the first active region extends in a first direction, while the first contact and first gate extend in a second direction, overlapping the first active region. Additionally, the first conductive line overlaps the first gate, and the first conductor overlaps the first contact, first gate, and first conductive line, extending in both directions. Another notable patent is an integrated circuit, system, and method of forming the same, which includes a set of power rails and active regions, along with conductive lines and vias that facilitate electrical coupling.

Career Highlights

Chih-Min Hsiao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has contributed to the company's reputation for excellence in integrated circuit design and manufacturing.

Collaborations

Hsiao has collaborated with notable colleagues, including Chien-Wen Lai and Chih-Ming Lai. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies.

Conclusion

Chih-Min Hsiao's contributions to the field of integrated circuits exemplify his innovative spirit and dedication to advancing technology. His patents and collaborations continue to influence the semiconductor industry significantly.

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