Hsinchu, Taiwan

Chih-Min Hsiao

This inventor holds 20 USPTO granted patents and 9 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Min Hsiao. Retrieved from https://idiyas.com/inventor/chih-min-hsiao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 85.0

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 6(Granted Patents)


Location History:

  • Hsinchu, TW (2021 - 2024)
  • Taoyuan, TW (2023 - 2024)

Company Filing History:


Years Active: 2021-2026

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Areas of Expertise:
Area Selective Deposition
Line-End Extension
Semiconductor Device
Integrated Circuit
Etch Process
Stacked Wafer Structure
Patterned Mask Layer
Self Aligned Lithography
Metal Line Control
Diagonal Via Pattern
Signal Line Patterning
20 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Chih-Min Hsiao

Introduction

Chih-Min Hsiao is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuits, holding a total of 20 patents. His work has been instrumental in advancing technology in semiconductor manufacturing.

Latest Patents

Among his latest patents, Hsiao has developed an integrated circuit and method of forming the same. This integrated circuit features a first active region, a first contact, a first gate, a first conductive line, a first conductor, and a first via. In various embodiments, the first active region extends in a first direction, while the first contact and first gate extend in a second direction, overlapping the first active region. Additionally, the first conductive line overlaps the first gate, and the first conductor overlaps the first contact, first gate, and first conductive line, extending in both directions. Another notable patent is an integrated circuit, system, and method of forming the same, which includes a set of power rails and active regions, along with conductive lines and vias that facilitate electrical coupling.

Career Highlights

Chih-Min Hsiao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has contributed to the company's reputation for excellence in integrated circuit design and manufacturing.

Collaborations

Hsiao has collaborated with notable colleagues, including Chien-Wen Lai and Chih-Ming Lai. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies.

Conclusion

Chih-Min Hsiao's contributions to the field of integrated circuits exemplify his innovative spirit and dedication to advancing technology. His patents and collaborations continue to influence the semiconductor industry significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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