Chih-Ching Cheng

Title: Innovations by Chih-Ching Cheng

Introduction

Chih-Ching Cheng is a prominent inventor based in Xizhou Township, Changhua County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on enhancing plasma etching processes, which are crucial in semiconductor fabrication.

Latest Patents

Cheng's latest patents include innovative methods and systems that improve the efficiency and effectiveness of plasma etching. One notable patent is for a "Dry etcher uniformity control by tuning edge zone plasma sheath." This invention involves a plasma etching system that generates plasma above a wafer in a plasma etching chamber, with a focus ring surrounding the wafer. The system straightens the plasma sheath above the focus ring by generating a supplemental electric field. Another significant patent is the "Plasma control method in semiconductor wafer fabrication." This method outlines a process for adjusting the distance between a gas dispenser and an upper edge ring surrounding a wafer chuck, ultimately producing plasma for processing the semiconductor wafer.

Career Highlights

Chih-Ching Cheng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to develop and refine his innovative ideas, contributing to advancements in semiconductor manufacturing.

Collaborations

Cheng collaborates with talented individuals in his field, including coworkers Chih-Teng Liao and Yi-Tsang Hsieh. Their combined expertise fosters a creative environment that drives innovation in semiconductor technology.

Conclusion

Chih-Ching Cheng's contributions to the semiconductor industry through his patents and collaborative efforts highlight his role as a key innovator. His work continues to influence advancements in plasma etching processes, showcasing the importance of innovation in technology.