The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Jul. 29, 2016
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Chia-Hsin Tai, Tainan, TW;
Chih-Ching Cheng, Xizhou Township, Changhua County, TW;
Fang-Yi Wu, Kaohsiung, TW;
Yi-Wei Chiu, Kaohsiung, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A method for manufacturing a semiconductor structure is provided. The method includes forming a mask layer over a substrate, forming a material layer over the mask layer, forming a first blocking structure and a second blocking structure in the material layer separated from each other, and forming a first opening and a second opening in the material layer aligned with the first blocking structure. The method further includes forming a first spacer on sidewalls of the first opening and a second spacer on sidewalls of the second opening, forming a third opening and a fourth opening in the material layer aligned with the second blocking structure, etching the mask layer through the first opening, the second opening, the third opening, and the fourth opening.