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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10879051 B1

PDFFull Text
Date of Patent:
Dec. 29, 2020

Filed:

May. 11, 2017

Method for controlling exposure region in bevel etching process for semiconductor fabrication

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chun-Hsing Wu, Zhubei, TW;

Hung-Jui Chang, Changhua County, TW;

Chih-Ching Cheng, Xizhou Township, Changhua County, TW;

Yi-Wei Chiu, Kaohsiung, TW;

Kun-Cheng Chen, Kaohsiung, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;

Attorney:

McClure, Qualey & Rodack, LLP

Primary Examiner:

Sylvia Macarthur

Assistant Examiner:

Michelle Crowell

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32651 (2013.01); H01J 37/32027 (2013.01); H01J 37/32036 (2013.01); H01J 37/32467 (2013.01); H01J 37/32477 (2013.01); H01L 21/02021 (2013.01); H01L 21/3065 (2013.01); H01J 2237/334 (2013.01);
Abstract

A plasma processing apparatus is provided. The apparatus includes a lower sheltering module. The apparatus further includes an upper sheltering module arranged adjacent to the lower sheltering module. The apparatus includes an upper plate and an upper PEZ ring positioned around the upper plate. The apparatus also includes a shadowing unit that includes a number of engaging parts in the form of arcs detachably positioned on the upper PEZ ring. In addition, the apparatus includes a plasma generation module for generating plasma in the peripheral region of the lower sheltering module and the upper sheltering module.

Find Patent Forward Citations

Wu, Chun-Hsing. (2020). Method for controlling exposure region in bevel etching process for semiconductor fabrication (U.S. Patent No. 10879051). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10879051

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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