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For the Inventor, By the Inventor

Tainan, Taiwan

Chi-Shen Lo

This inventor holds 5 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1998-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chi-Shen Lo. Retrieved from https://idiyas.com/inventor/chi-shen-lo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5

% Patents Active = 40.0

Average Co-Inventor Count = 3.9

ph-index = 2

Forward Citations = 18(Granted Patents)


Location History:

  • Hsin-Chu, TW (1998 - 2002)
  • Tainan, TW (2004 - 2007)

Company Filing History:

goldMedal5 out of 42,965 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 1998-2007

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5 patents (USPTO):Explore Patents
1. 7196006 - Manufacturing method for microelectronic device (2007-03-27),
2. 6862545 - Linewidth measurement tool calibration method employing linewidth standard (2005-03-01),
3. 6710889 - Method for improved dielectric layer metrology calibration (2004-03-23),
4. 6485576 - Method for removing coating bead at wafer flat edge (2002-11-26),
5. 5783097 - Process to avoid dielectric damage at the flat edge of the water (1998-07-21),

Title: Chi-Shen Lo: Innovator in Microelectronic Manufacturing

Introduction

Chi-Shen Lo is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of microelectronics, holding a total of 5 patents. His work focuses on improving manufacturing processes and measurement accuracy in microelectronic devices.

Latest Patents

Chi-Shen Lo's latest patents include a manufacturing method for microelectronic devices. This method involves performing a first inspection of a device feature during an intermediate stage of manufacture, cleaning the device feature after the first inspection, and conducting a second inspection after cleaning. Another notable patent is a linewidth measurement tool calibration method. This method employs a correction of periodic actual measurements of a topographic feature within a linewidth standard, utilizing an exponentially weighted moving average for more accurate calibration and measurement of linewidths in microelectronic products.

Career Highlights

Chi-Shen Lo is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and enhance manufacturing techniques. His expertise in microelectronics has positioned him as a valuable asset in the industry.

Collaborations

Chi-Shen has collaborated with notable coworkers such as Pey-Yuan Lee and Yi-Hung Chen, contributing to advancements in their shared field of expertise.

Conclusion

Chi-Shen Lo's innovative work in microelectronics and his impressive portfolio of patents highlight his significant impact on the industry. His contributions continue to shape the future of microelectronic manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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