Company Filing History:
Years Active: 2003-2017
Title: Chi-Liang Kuo: Innovator in Semiconductor Manufacturing
Introduction
Chi-Liang Kuo is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 6 patents. His innovative approaches have advanced the technology used in semiconductor devices.
Latest Patents
Chi-Liang Kuo's latest patents include a method of manufacturing a semiconductor device. This method involves forming an opening in a dielectric layer, which exposes a non-conductive layer over a semiconductor substrate. It also includes forming a self-assembled monolayer (SAM) within the opening and over the non-conductive layer, followed by creating a catalytic layer within the opening and filling it with a conductive material to form a plug. Another notable patent relates to a conductive interconnect layer, which features a dielectric layer over a substrate and an opening that extends downwardly through the dielectric layer. This innovative design enhances the efficiency of semiconductor devices.
Career Highlights
Throughout his career, Chi-Liang Kuo has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and United Microelectronics Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Chi-Liang Kuo has collaborated with notable professionals in the field, including Hsiang-Huan Lee and Chao-Hsien Peng. These collaborations have fostered innovation and have led to the development of new technologies in semiconductor manufacturing.
Conclusion
Chi-Liang Kuo's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor technology.