Cheng-Wei Chen

Title: Innovations of Cheng-Wei Chen

Introduction

Cheng-Wei Chen is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of Fin FET devices. With a total of 10 patents to his name, his work has had a substantial impact on the industry.

Latest Patents

One of Cheng-Wei Chen's latest patents is titled "Flat STI Surface for Gate Oxide Uniformity in Fin FET Devices." This patent outlines operations in fabricating a Fin FET, which includes providing a substrate with a fin structure. The upper portion of the fin structure has a first fin surface profile. An isolation region is formed on the substrate and in contact with the fin structure. A portion of the isolation region is recessed by an etch process to create a recessed portion that exposes the upper portion of the fin structure, where the recessed portion has a first isolation surface profile. A thermal hydrogen treatment is then applied to both the fin structure and the recessed portion. This process allows for the formation of a gate dielectric layer with a substantially uniform thickness over the fin structure. The recessed portion is adjusted from the first isolation surface profile to a second isolation surface profile, while the fin structure is adjusted from the first fin surface profile to a second fin surface profile through the thermal hydrogen treatment.

Career Highlights

Cheng-Wei Chen has worked with notable organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and National Yunlin University of Science and Technology. His experience in these institutions has allowed him to refine his expertise in semiconductor fabrication and innovation.

Collaborations

Throughout his career, Cheng-Wei Chen has collaborated with esteemed colleagues, including Cheng-Ta Wu and Ting-Chun Wang. These partnerships have contributed to the advancement of technology in their respective fields.

Conclusion

Cheng-Wei Chen's contributions to semiconductor technology and his innovative patents demonstrate his significant role as an inventor. His work continues to influence the development of advanced electronic devices.