Introduction: Cheng-Te Wang, an accomplished inventor based in Hsinchu County, Taiwan, has made significant contributions to the field of layout pattern technologies. With a remarkable portfolio of 14 patents, Wang's innovations continue to shape industries reliant on precision patterning and optical proximity correction.

Latest Patents: Among his notable contributions, two recent patents exemplify his innovative spirit. The first, a "Method for correcting bevel corners of a layout pattern," introduces a systematic approach to correcting layout patterns that include adjacent rectangular sub-patterns. This method involves inputting a layout pattern into a computer system for optical proximity correction, where bevel corrections are formed at the corners of sub-patterns. This process enhances the interaction between segments while maintaining precision.

The second patent, titled "Pattern verifying method," outlines a process for decomposing a target pattern into first and second patterns. Wang’s innovative approach integrates a first and second OPC (Optical Proximity Correction) process followed by an inspection process that includes an after-mask inspection. This method efficiently verifies the integrity of complex patterns, showcasing his commitment to advancing technological accuracy.

Career Highlights: Cheng-Te Wang's career is marked by his affiliation with United Microelectronics Corporation, a leading player in the semiconductor industry. His role as a product developer has allowed him to leverage his expertise in layout patterns and optical technologies. His portfolio of patents stands as a testament to his dedication to innovation and continuous improvement in his work.

Collaborations: Throughout his career, Wang has collaborated with talented coworkers such as Ming-Jui Chen and Jing-Yi Lee. Their mutual dedication to advancing semiconductor technologies has resulted in substantial developments that benefit the entire industry. Such collaborations emphasize the importance of teamwork in achieving groundbreaking innovations.

Conclusion: Cheng-Te Wang exemplifies the pioneering spirit of inventors today, utilizing his skills to develop technologies that enhance the semiconductor field. His 14 patents reflect a deep commitment to innovation, impacting not only his company but the industry as a whole. As technologies continue to evolve, Wang's contributions will undoubtedly serve as a foundation for future advancements in layout pattern methodologies.

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