The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
May. 17, 2011
Te-hsien Hsieh, Kaohsiung, TW;
Ming-jui Chen, Tainan, TW;
Shih-ming Kuo, Tainan, TW;
Ping-i Hsieh, Tainan, TW;
Cheng-te Wang, Hsinchu County, TW;
Jing-yi Lee, Tainan, TW;
Te-Hsien Hsieh, Kaohsiung, TW;
Ming-Jui Chen, Tainan, TW;
Shih-Ming Kuo, Tainan, TW;
Ping-I Hsieh, Tainan, TW;
Cheng-Te Wang, Hsinchu County, TW;
Jing-Yi Lee, Tainan, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A double patterning mask set includes a first mask having a first set of via patterns, and a second mask having a second set of via patterns. The first set of via patterns includes at least two via patterns arranged along a diagonal direction, each of the at least two via patterns has at least a truncated corner. The first set of via patterns and the second set of via patterns are interlacedly arranged along a horizontal direction and a vertical direction.