Location History:
- Tainan County, TW (2012)
- Tainan, TW (2013 - 2019)
Company Filing History:
Years Active: 2012-2019
Title: Innovations of Jing-Yi Lee
Introduction
Jing-Yi Lee is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of layout pattern correction and verification. With a total of 10 patents to his name, his work has had a substantial impact on the semiconductor industry.
Latest Patents
One of his latest patents is a method for correcting bevel corners of a layout pattern. This innovative method involves providing a layout pattern that includes at least two adjacent rectangular sub-patterns. The layout pattern is input into a computer system, where an optical proximity correction, including a bevel correction, is performed. The bevel correction entails forming a bevel at a corner of at least one of the two adjacent rectangular sub-patterns. The bevel is created by chopping the corner and adjusting its position based on the distance to the neighboring rectangular sub-pattern. The angle between the bevel surface and the rectangular sub-pattern surface is not rectangular, and the corrected layout pattern is then output to a mask after the optical proximity correction.
Another significant patent by Jing-Yi Lee is a pattern verifying method. This method begins with decomposing a target pattern into a first pattern and a second pattern. A first optical proximity correction (OPC) process is performed on the first pattern to create a revised version, while a second OPC process is applied to the second pattern. An inspection process follows, which includes an after mask inspection (AMI) process that considers the target pattern along with the first and second patterns.
Career Highlights
Jing-Yi Lee is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to develop and refine his innovative techniques in layout pattern correction and verification.
Collaborations
Throughout his career, Jing-Yi Lee has collaborated with notable colleagues, including Te-Hsien Hsieh and Ming-Jui Chen. These collaborations have contributed to the advancement of technology in their field.
Conclusion
Jing-Yi Lee's contributions to the field of layout pattern correction and verification are noteworthy. His innovative methods and patents have significantly influenced the semiconductor industry, showcasing his expertise and dedication to advancing technology.