The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Jul. 31, 2012
Te-hsien Hsieh, Kaoshiung, TW;
Ming-jui Chen, Hsinchu, TW;
Cheng-te Wang, Hsinchu County, TW;
Shih-ming Kuo, Tainan, TW;
Jing-yi Lee, Tainan, TW;
Te-Hsien Hsieh, Kaoshiung, TW;
Ming-Jui Chen, Hsinchu, TW;
Cheng-Te Wang, Hsinchu County, TW;
Shih-Ming Kuo, Tainan, TW;
Jing-Yi Lee, Tainan, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A method of optical proximity correction (OPC) includes the following steps. At first, a layout pattern is provided to a computer system. Subsequently, the layout pattern is classified into at least a first region and at least a second region. Then, several iterations of OPC calculations are performed to the layout pattern, and a total number of OPC calculations performed in the first region is substantially larger than a total number of OPC calculations performed in the second region. Afterwards, a corrected layout pattern is outputted through the computer system onto a mask.