The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Dec. 27, 2011
Te-hsien Hsieh, Kaohsiung, TW;
Ming-jui Chen, Hsinchu, TW;
Cheng-te Wang, Hsinchu County, TW;
Jing-yi Lee, Tainan, TW;
Te-Hsien Hsieh, Kaohsiung, TW;
Ming-Jui Chen, Hsinchu, TW;
Cheng-Te Wang, Hsinchu County, TW;
Jing-Yi Lee, Tainan, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A mask pattern and a correcting method thereof are provided. The correcting method includes the following steps. An original pattern having a first original contour and a second original contour is provided. The first original contour has a first original corner. The second original contour has a second original corner, which is near the first original corner. The first and second original corners are cut to form a cut pattern. An optical proximity correction (OPC) process is applied to the cut pattern to form the mask pattern.