Chen-Hsiung Yang

Title: **Inventor Chen-Hsiung Yang and His Contributions to Semiconductor Technology**

Introduction

Chen-Hsiung Yang is a notable inventor based in Taipei Hsien, Taiwan. With a remarkable portfolio of ten patents, Yang has made significant strides in the field of semiconductor technology. His innovative methods aim to improve processes critical to microelectronics and fabrication.

Latest Patents

Among his latest patents, two stand out for their impact in the industry. The first is a **Method of Performing a Double-Sided Process**, which provides an innovative approach to handling wafers in semiconductor fabrication. The process involves bonding a wafer with a structural pattern to a carrier and defines various scribe lines for enhanced precision in manufacturing. This method showcases a careful integration of multiple steps to yield a final product with increased reliability.

The second patent, the **Method of Fabricating Suspended Structure**, outlines a process for creating structures that are suspended over a substrate. This method utilizes a hardened photoresist layer that is precisely etched to achieve a desired profile before employing a dry etching process to create the suspended structure. These contributions underscore Yang's ingenuity in addressing complex challenges in semiconductor manufacturing.

Career Highlights

Throughout his career, Chen-Hsiung Yang has been associated with several reputable companies, including Touch Micro-System Technology Corp. and Touch Micro-Systems Technology Inc. His work at these organizations reflects his commitment to advancing technology in microelectronic applications, where innovation is paramount.

Collaborations

In his professional journey, Yang has collaborated with prominent colleagues such as Shih-Feng Shao and Hsin-Ya Peng. These collaborations not only highlight his ability to work effectively within teams but also contribute to the development of innovative solutions in the semiconductor field.

Conclusion

In summary, Chen-Hsiung Yang's inventive work and patents serve as critical advancements in semiconductor technology. His methods for handling wafers and fabricating structures have significant implications for the microelectronics industry. As he continues to innovate, his contributions will undoubtedly inspire future developments in the field.