Chao-Chun Chen

Title: Innovations of Chao-Chun Chen in Semiconductor Technology

Introduction

Chao-Chun Chen is a prominent inventor based in Kao-Hsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work primarily focuses on methods for fabricating metal-oxide semiconductor transistors, which are crucial for modern electronic devices.

Latest Patents

Chao-Chun Chen's latest patents include innovative methods for fabricating metal-oxide semiconductor transistors. One of his patents discloses a method that involves providing a semiconductor substrate, forming a gate structure on it, and performing a first ion implantation process. This process implants a first molecular cluster containing carbon, boron, and hydrogen into the semiconductor substrate at two sides of the gate structure to form a doped region. The molecular weight of the first molecular cluster is greater than 100. Another patent outlines a similar method, where a semiconductor substrate with a gate structure is provided, and a spacer is formed around the gate structure. An ion implantation process is then performed to implant a molecular cluster containing carbon, boron, and hydrogen into the substrate at two sides of the spacer, also forming a doped region. A millisecond annealing process is subsequently performed to activate the molecular cluster within the doped region.

Career Highlights

Chao-Chun Chen is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to develop and refine his innovative techniques in semiconductor fabrication.

Collaborations

Chao-Chun Chen has collaborated with notable coworkers, including Tsai-Fu Hsiao and Hsiang-Ying Wang. Their combined expertise has contributed to advancements in semiconductor technology.

Conclusion

Chao-Chun Chen's contributions to semiconductor technology through his patents and work at United Microelectronics Corporation highlight his role as an influential inventor in the field. His innovative methods for fabricating metal-oxide semiconductor transistors continue to impact the electronics industry significantly.