Tainan, Taiwan

Chang-Mao Wang


Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014-2025

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8 patents (USPTO):Explore Patents

Title: Chang-Mao Wang: Innovator in Lithographic Technology

Introduction

Chang-Mao Wang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of lithographic technology, holding a total of 8 patents. His innovative methods have advanced the capabilities of semiconductor manufacturing.

Latest Patents

One of his latest patents is a method of removing step height on gate structures. This method involves providing a substrate with a gate structure disposed on it. A dielectric layer covers the gate structure and substrate, followed by the formation of a composite material layer. The process includes removing part of the composite material layer to create a step height on the gate structure, which is then eliminated through wet etching. Another notable patent is for correcting critical dimension measurements of lithographic tools. This method includes providing a correction pattern on a lithographic mask and measuring critical dimensions of developed patterns to adjust exposure conditions and measuring parameters accordingly.

Career Highlights

Chang-Mao Wang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work focuses on enhancing lithographic processes, which are crucial for the production of integrated circuits.

Collaborations

He has collaborated with notable coworkers such as Chun-Chi Yu and Hsin-Yu Hsieh, contributing to various projects that aim to improve lithographic techniques and technologies.

Conclusion

Chang-Mao Wang's innovative work in lithographic technology has made a significant impact on the semiconductor industry. His patents reflect his commitment to advancing manufacturing processes and improving measurement accuracy.

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