The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Feb. 09, 2012
Hung-yi Wu, Keelung, TW;
Yuan-chi Pai, Tainan, TW;
Yu-wei Cheng, Kaohsiung, TW;
Chang-mao Wang, Tainan, TW;
Hung-Yi Wu, Keelung, TW;
Yuan-Chi Pai, Tainan, TW;
Yu-Wei Cheng, Kaohsiung, TW;
Chang-Mao Wang, Tainan, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A photoresist removal method is described. A substrate having thereon a positive photoresist layer to be removed is provided. The positive photoresist layer is UV-exposed without using a photomask. A development liquid is used to remove the UV-exposed positive photoresist layer. The substrate as provided may further have thereon a sacrificial masking layer under the positive photoresist layer. The sacrificial masking layer is removed after the UV-exposed positive photoresist layer is removed.