Yu-Wei Cheng

Title: Innovations of Yu-Wei Cheng

Introduction

Yu-Wei Cheng is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of technology, particularly in the area of alignment systems and overlay targets. With a total of 5 patents to his name, Cheng continues to push the boundaries of innovation.

Latest Patents

One of his latest patents is an overlay target that includes a plurality of working zones and a plurality of line segments. The line segments in each of the working zones have a variety of widths and are parallel to each other. Another notable patent is an alignment system that features a light source for emitting light. This system includes an alignment mark disposed on a substrate for receiving the light. The alignment mark consists of a first pattern and a second pattern, each with symmetrical regions that enhance precision in alignment.

Career Highlights

Yu-Wei Cheng is currently employed at United Microelectronics Corporation, where he applies his expertise in developing advanced technologies. His work has been instrumental in improving the efficiency and accuracy of various systems.

Collaborations

Cheng has collaborated with several talented individuals, including Bo-Jou Lu and Chun-Chi Yu. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Yu-Wei Cheng's contributions to technology through his patents and collaborations highlight his role as a key innovator in his field. His work continues to inspire advancements in alignment systems and overlay targets.