Chandra V Mouli

Boise, ID, United States of America

Chandra V Mouli

This inventor holds 319 USPTO granted patents and 15 published patent applications and 19 EPO patents, primarily in Semiconductor Devices (CPC class H01L27-11582). Top assignees: Micron Technology Incorporated, Aptina Imaging Corporation, Intel Corporation. Active years: 2000-2024.

USPTO Granted Patents = 319 

% Patents Active = 89.3

 

Average Co-Inventor Count = 1.5

ph-index = 23

Forward Citations = 2,545(Granted Patents)

Forward Citations (Not Self Cited) = 2,270(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Portland, OR (US) (2009 - 2010)
  • Boise, ID (US) (2000 - 2024)

Company Filing History:


Years Active: 2000-2024

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Areas of Expertise:
Semiconductor Devices
Transistors
Memory Structures
Low Capacitance Vias
Field-Effect Transistors
Strained Silicon
Vertical Channel Material
Integrated Structures
Memory Cells
Two-Dimensional Materials
Ferroelectric Insulators
High Band Gap Material
319 patents (USPTO):Explore Patents

Title: Chandra Mouli: A Trailblazer in Innovation

Introduction:

Throughout his illustrious career, Chandra Mouli, a highly accomplished inventor and innovator, has consistently pushed the boundaries of technological advancements. Known for his exceptional contributions to the field, Mouli has developed and commercialized several groundbreaking inventions that have revolutionized diverse industries. This article explores his latest patents, career highlights, notable collaborations, and the lasting impact of his innovative mindset.

Latest Patents:

Chandra Mouli's latest patents demonstrate his commitment to exploring cutting-edge technologies. One of his notable inventions includes the "Gate-all-around floating-gate field effect memory transistor constructions including ferroelectric gate insulator." This groundbreaking field-effect transistor construction improves efficiency and memory capabilities, making it highly valuable for data storage applications.

Another notable patent is the "Integrated assemblies containing diffusion alleviating two-dimensional materials." This innovation combines semiconductive and metallic materials with two-dimensional substrates to enhance performance and optimize electronic components. These integrated assemblies can alleviate diffusion-related challenges, resulting in improved device longevity and performance.

Career Highlights:

Over the course of his career, Chandra Mouli has amassed an impressive portfolio of 310 patents, highlighting his unrivaled commitment to innovation. With a focus on semiconductor technologies, his contributions have spanned diverse sectors, including memory devices, image sensors, and integrated circuits.

Mouli's professional journey has included impactful roles in renowned companies such as Micron Technology Incorporated and Aptina Imaging Corporation. These experiences have nurtured his ability to drive technological advancements and propel the industry forward.

Collaborations:

Collaboration plays a vital role in the process of innovation, and Chandra Mouli has had the privilege of working alongside esteemed professionals. Notable collaborators include Fernando Gonzalez and Gurtej S Sandhu. Their combined expertise and shared enthusiasm for pushing the boundaries of technological advancements have undoubtedly resulted in groundbreaking inventions.

Conclusion:

Chandra Mouli's career is a testament to his unwavering dedication to innovation and the pursuit of excellence. With his extensive patent portfolio and numerous career highlights, his contributions have had a profound impact on the technological landscape. His latest patents, including advancements in memory transistors and integrated assemblies, are poised to revolutionize various industries.

As the realm of innovation continues to evolve, Chandra Mouli's trailblazing spirit and commitment to pushing boundaries serve as an inspiration to aspiring inventors and entrepreneurs worldwide. Through his relentless pursuit of innovation, Mouli has cemented his name as a leading figure in the field, leaving an enduring legacy that will shape the future of technology.

Profile summary based on public USPTO records.
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