Cha-Won Koh

This inventor holds 28 USPTO granted patents and 1 published patent application, primarily in Semiconductor Manufacturing. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2008-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cha-Won Koh. Retrieved from https://idiyas.com/inventor/cha-won-koh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 (Patent Applications = 1)

% Patents Active = 82.1

Average Co-Inventor Count = 4.3

ph-index = 6

Forward Citations = 505(Granted Patents)

Location History:

Gyeonggi-do, KR (2016)
Yongin-si, KR (2008 - 2020)

Company Filing History:

28 out of 132,108

Samsung Electronics Co., Ltd.

patents

Years Active: 2008-2020

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Areas of Expertise:

Semiconductor Device

Photoresist Patterns

Lithography Techniques

Chemical Solutions

Fine Patterns

Double Patterning

Flash Memory

E-Beam Lithography

Hard Mask Patterns

Thermal Electron Enhancement

Nonvolatile Memory

28 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10797056 - Semiconductor device and method of manufacturing the same (2020-10-06),

2. 10688437 - Filter structure for chemical solution used in manufacturing integrated circuit and apparatus for supplying chemical solution including filter structure for chemical solution (2020-06-23),

3. 10586798 - Semiconductor device and method of manufacturing the same (2020-03-10),

4. 10438810 - Method of forming photoresist pattern and method of fabricating semiconductor device using the same (2019-10-08),

5. 10345701 - Photoresist polymers, photoresist compositions, methods of forming patterns and methods of manufacturing semiconductor devices (2019-07-09),

6. 9842852 - Methods of forming patterns using photoresist polymers and methods of manufacturing semiconductor devices (2017-12-12),

7. 9772555 - Methods of forming patterns using photoresists (2017-09-26),

8. 9520289 - Methods of forming a pattern of a semiconductor device (2016-12-13),

9. 9482953 - Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same (2016-11-01),

10. 9412604 - Methods of manufacturing semiconductor device (2016-08-09),

11. 9147687 - Methods of fabricating semiconductor devices (2015-09-29),

12. 8999840 - Method of forming fine patterns of semiconductor device (2015-04-07),

13. 8557131 - Methods of forming fine patterns and methods of fabricating semiconductor devices (2013-10-15),

14. 7998874 - Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same (2011-08-16),

15. 7892982 - Method for forming fine patterns of a semiconductor device using a double patterning process (2011-02-22),

Title: Cha-Won Koh: Pioneering Inventor from Yongin-si, South Korea

Introduction: Cha-Won Koh is a distinguished inventor hailing from Yongin-si, South Korea, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Cha-Won Koh holds several patents in the realm of electronics and telecommunications, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Cha-Won Koh has worked tirelessly to develop cutting-edge solutions that have revolutionized the industry. His innovative mindset and passion for creating have led to the successful implementation of numerous projects.

Collaborations: Throughout his career, Cha-Won Koh has collaborated with leading tech companies and research institutions, fostering a culture of innovation and knowledge-sharing. His ability to work in diverse teams has resulted in the development of groundbreaking technologies.

Conclusion: Cha-Won Koh's relentless pursuit of innovation and his remarkable contributions to the field make him a true pioneer in the world of inventions. His work continues to inspire future generations of inventors and innovators worldwide.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

1 patent pending: